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  • Tuning the thickness of black phosphorus via ion bombardment-free plasma etching for device performance improvement
  • 조회 수: 265, 2016-09-30 13:15:55(2016-09-30)

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    We demonstrated plasma-assisted thickness control of black phosphorus(BP) using a conventional RIE system. Thickness controlled BP shows enhanced electrical performance, Ion/Ioff ratio and hole mobility increased by factors of ~5 and ~ 2 under ambient condition. This method suggests a controllable and scalable thinning process of 2D materials free from causing structural damage.


    link : http://pubs.rsc.org/is/content/articlehtml/2016/tc/c6tc01514j

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